Tantalum (Ta)Thin Film Magnetron Sputtering Deposition System-RTSP1000

Deposition of Tantalum, Gold precious metals by Sputtering   

Sputtering is widely used to deposit refractory metals like tantalum, titanium, tungsten, niobium, which would require very high temperatures of deposition, and precious metals: Gold and Silver and which is also used for deposition of lower melting points metals like copper, aluminum, nickle, chrome etc. 

Tantalum is most used in the electronic industry as a protective coating because of its good resistance to erosion.

Sputtered tantalum films are widely used in the
1.  Microelectronics industry as the films can be reactively sputtered and thus resistivity and temperature coefficient of resistance can be controlled;

2. Medical instruments like body implants for its highly biocompatability property; 

3. Coatings on corrosion resistant parts, such as thermowells, valve bodies, and fasteners;

4. Sputtered tantalum can be also be used as an effective corrosion resistance barrier if the coating is continuous, defected  and is adherent to the substrate is intended to protect. 

Royal Technology’s standardized Tantalum sputtering deposition system: RTSP1000 model.
 Tantalum sputtered film properties:
Low resistivity

High corrosion and wear resistant coatings on surface that are subjected to high stresses and harsh chemical and erosive environment.  

Design features:

 Robust Design, Stable Quality, Fast Cycle, High Precision System 

Equipment Structure:

Coating System Structure: Vertical orientation, octagonal structure, 2 doors for easy access.

Environmentally friendly system, no hazardous wastes.

Total integration, modular design
Commercialized and standardized for industrial mass production
Extremely efficient ion source for strong adhesion and high ionization.
Easy Operation: Touch screen + PLC control, one touch operation
Special design of Carousel system for high uniformity deposition.
High productivity and stability, working 24/7 a week.
Flexible, matches to various sizes of plates

Key components 

Ion source for assisted depositon  process:

Ion source for plasma iteching process:

The RT1200-FCEV machine is a batch model sputtering system, which can deposit various hard coatings, soft coatings, compound films and solid lubricating films on the metallic and non-metallic materials substrates. Applied to industries of Hydrogen Fuel Cell vehicles, photonic products, aerospace and other new energy industries.

Performances of the deposition films:

To improve the conductivity of surface;

High corrosion resistance;

High wear resistance;

High hardness

 Hydrophobic composition film and other functional films

Available for compound coatings: metallic and non-metallic films.

Film thickness range from 100nm to 12μm, thickness tolerance ±5%

Strong adhesion.

Low tempering parts surface hardening treatment.

Type: 

Vertical orientation, octal structure, 2-doors (front and back)

Design advantages:

• Environmentally friendly system, no industrial waste water, air and noise pollution;
• Easy Operation: Touch screen + PLC control and unique software program for one touch operation, more than 80% trouble shootings alarm.
• Up to 10 processing recipes login and backup; high repeatability and diversity.
• Special design of Carousel system for high uniformity of film deposition.
• High productivity and high quality
• Stable and reliable system, running 365 days * 24hrs (maintenance and repair breaking time)
• Efficiency pumping system: shorter vacuum piping lines for maximum piping speed with well known European pump brands
• Compact design occupy minimum installation space.

Contact us for more details. Royal Tech team is honored to serve you with our best service and  knowleage.