|
| Brand Name: | ROYAL |
| Model Number: | CsI950 |
| MOQ: | 1 set |
| Price: | negotiable |
| Payment Terms: | L/C, T/T |
| Supply Ability: | 15 sets per month |
CsI950 High Vacuum Deposition System is exclusively designed for CsI and TII metallization on scintillation screens in an extremely high vacuum environment. The CsI scintillators 200～600µm in thickness ranges with high uniformity of thickness and brightness performance:
Ultra- High Spatial Resolution of Imaging;
Fast response for sharper imaging;
Class leading edge-to-edge image areas;
Optical absorb layers or reflector layers;
Low patient X-ray dose.
Substrates Applied: TFT glass, Fiber Optic Plate, Amorphous-carbon plate, Aluminum plate
Application: for security check and inspection, high energy physics education, nuclear radiaton detection and medical imagings: chest examination, mamography, dental inter oral and panoramic.
Technical Advantages
Royal Technology provides 2 models machine: CsI950 and CsI950A+
The model CsI950A+ is updated based on the 1st generation CsI950, its advantages:
1. Efficiency
-CsI-950A+ model is with 2-rotary rack structure based on Generation -one CsI-950 model.
-Double-capacity for max. size substrate: 500 x400mm.
2. Repeatability & Reproducibility
-Through high precised parameter control system,
-Automated process control software and program,
-User friendly operation.
3. Reliability
-24/7 days non-stop operation;
-Inficon Film Thickness Controller to monitor the film thickness inline.
-Temperature control accuracy: ±1 ℃, multi-stage setting, automatic temperature data recording and control
-Rotary racks equipped with Servo-Motor for high accuracy and stability.
4. Safety
-High vacuum pump: Magnetic Suspension Molecular Pump, with nitrogen gas blowing device to avoid hazard material be exposed in the air;
-All electrodes are equipped with safety protection sleeves.
Technical Parameters
| Description | CsI-950 |
CsI-950A+
|
|
Deposition chamber (mm)
|
φ950 x H1350 |
φ950 x H1350
|
| Loading rotary racks | 1 | 2 |
| Evaporation sources | 2 |
2
|
| Heating method |
Iodine tungsten lamp Max. 1800℃ |
Iodine tungsten lamp Max. 1800℃ |
| Ultimated vacuum pressure (Pa) | 8.0×10-5Pa | 8.0×10-5Pa |
| Magnetic Suspension Molecular Pump | 1 x 3400L/S |
1 x 3400L/S
|
| Roots Pump | 1 x 490m³/h |
1 x 490m³/h
|
| Rotary Vane Pump | 1 x 300m³/h |
1 x 300m³/h
|
| Deposition Controller | Quartz Control x 1 |
Quartz Control x 1
|
| Power Consumption (KW) |
Max. approx. 62 Average approx. 32 |
Max. approx. 65 Average approx. 35 |
