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Magnetron Sputtering Coating Machine
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DLC-C Ta Carbon Tantalum Sputtering Deposition System

DLC-C Ta Carbon Tantalum Sputtering Deposition System

Brand Name: ROYAL
Model Number: RTSP
MOQ: 1 set
Price: negotiable
Payment Terms: L/C,T/T
Supply Ability: 10 sets per month
Detail Information
Place of Origin:
Made in China
Certification:
CE
Name:
Tantalum PVD Sputtering Deposition Machine
Coatings:
Tantalum, Gold, Silver Etc.
Technology:
Pulsed DC Sputtering
Application:
Microelectronics Industry,Medical Instruments ,Coatings On Corrosion Resistant Parts,,
Ta Film Properties:
Tantalum Is Most Used In The Electronic Industry As A Protective Coating Because Of Its Good Resistance To Erosion.
Factory Location:
Shanghai City, China
Worldwide Service:
Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America
Training Service:
Machine Operation, Maintenance, Coating Process Recipes, Program
Warranty:
Limited Warranty 1 Year For Free, Whole Life For Machine
OEM & ODM:
Available, We Support Tailor Made Design And Fabrication
Packaging Details:
Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Supply Ability:
10 sets per month
Highlight:

Tantalum Sputtering Deposition System

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Anti Corrosion Sputtering Deposition System

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Pulsed DC Sputtering Deposition System

Product Description

Magnetron Sputtering is widely used to deposit refractory metals like tantalum, titanium, tungsten, niobium, which would require very high temperatures of deposition, and precious metals: Gold and Silver and which is also used for deposition of lower melting points metals like copper, aluminum, nickle, chrome etc.

Tantalum is most used in the electronic industry as a protective coating because of its good resistance to erosion.

Applications of Sputtered Tantalum thin film:
1. Microelectronics industry as the films can be reactively sputtered and thus resistivity and temperature coefficient of resistance can be controlled;

  1. Medical instruments like body implants for its highly biocompatability property;
  2. Coatings on corrosion resistant parts, such as thermowells, valve bodies, and fasteners;
  3. Sputtered tantalum can be also be used as an effective corrosion resistance barrier if the coating is continuous, defected and is adherent to the substrate is intended to protect.

DLC-C Ta Carbon Tantalum Sputtering Deposition System 0DLC-C Ta Carbon Tantalum Sputtering Deposition System 1


Technical Advantages

  1. A standardized trolley is applied which allows easy and safe loading/unloading of the substrate holders and work pieces in/out of the deposition chamber
  2. The system is safety interlocked to prevent incorrect operation or unsafe practices
  3. The substrate heaters are provided which mounted in the center of chamber, PID controlled thermocouple for high accuracy, to enhance the condense film’s adhesion
  4. Strong vacuum pumps configurations with Magnetically suspension molecular pump via gate valve connected to chamber; backed with Leybold’s roots pump and two stage rotary vane pump, mechanical pump.
  5. High energy ionized plasma source is applied with this system to guarantee the uniformity and density.


    DLC-C Ta Carbon Tantalum Sputtering Deposition System 2DLC-C Ta Carbon Tantalum Sputtering Deposition System 3


Royal Technology’s standardized Tantalum sputtering deposition system: RTSP1000

Insite:

Built Time: 2018

Location: China

DLC-C Ta Carbon Tantalum Sputtering Deposition System 4

Please contact us for more applications and specifications.